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        當前位置:首頁   >  產品中心  >  二維材料  >  二維材料薄膜  >  二氧化硅襯底的全區域覆蓋的單層二硫化鉬

        二氧化硅襯底的全區域覆蓋的單層二硫化鉬

        簡要描述:This product contains full area coverage MoS2 monolayers on SiO2/Si substrates. Sample size measures 1cm in size and the entire sample surface contains monolayer thick MoS2 sheet.

        • 更新時間:2024-06-03
        • 產品型號:
        • 廠商性質:生產廠家
        • 訪  問  量:1542

        詳細介紹

        This product contains full area coverage MoS2 monolayers on SiO2/Si substrates. Sample size measures 1cm in size and the entire sample surface contains monolayer thick MoS2 sheet. Synthesized full area coverage monolayer MoS2 is highly luminescent and Raman spectroscopy studies also confirm the monolayer thickness. In comparison to full area coverage MoS2 on sapphire, full area coverage MoS2 on SiO2/Si display higher PL intensity.



        Sample Properties.

        Sample size

        1cm x 1cm square shaped

        Substrate type

        Thermal oxide (SiO2/Si) substrates

        Coverage

        Full Coverage Monolayer

        Electrical properties

        1.85 eV Direct Bandgap Semiconductor

        Crystal structure

        Hexagonal Phase

        Unit cell parameters

        a = b = 0.313 nm, c = 1.230 nm,

        α = β = 90°, γ = 120°

        Production method

        Atmospheric Pressure Chemical Vapor Deposition (APCVD)

        Characterization methods

        Raman, photoluminescence, TEM, EDS

        Specifications

        1)    Identification. Full coverage 100% monolayer MoS2 uniformly covered across SiO2/Si substrates.

        2)    Physical dimensions. One centimeter in size. Larger sizes up to 2-inch wafer-scale available upon requests.

        3)    Smoothness. Atomically smooth surface with roughness < 0.2 nm.

        4)    Uniformity. Highly uniform surface morphology. MoS2 monolayers uniformly cover across the SiO2/Si substrates.

        5)    Purity. 99.9995% purity as determined by nano-SIMS measurements

        6)    Reliability. Repeatable Raman and photoluminescence response

        7)    Crystallinity. High crystalline quality, Raman response, and photoluminescence emission comparable to single crystalline monolayer flakes.

        8)    Substrate. SiO2/Si substrates. But our research and development team can transfer MoS2 monolayers onto variety of substrates including PET and quartz without significant compromisation of material quality.

        9)    Defect profile. MoS2 monolayers do not contain intentional dopants or defects. However, our technical staff can produce defected MoS2 using α-bombardment technique.


        Supporting datasets [for 100% Full area coverage on SiO2/Si]



        Transmission electron images (TEM) acquired from CVD grown full area coverage MoS2 monolayers on SiO2/Si confirming highly crystalline nature of monolayers


        Energy dispersive X-ray spectroscopy (EDX) characterization on CVD grown full area coverage MoS2 on SiO2/Si confirming Mo:S 1:2 ratios


        Room temperature photoluminescence spectroscopy (PL) and Raman spectroscopy (Raman) measurements performed on CVD grown full area coverage MoS2 monolayers on SiO2/Si. Raman spectroscopy measurement confirm monolayer nature of the CVD grown samples and PL spectrum display sharp and bright PL peak located at 1.85 eV in agreement with the literature.


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