13651969369
當(dāng)前位置：首頁(yè) > 產(chǎn)品中心 > 二維材料 > 二維材料薄膜 > CVD缺陷生長(zhǎng)二維層
簡(jiǎn)要描述：Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses.
更新時(shí)間：2024-06-03產(chǎn)品型號(hào)： 廠商性質(zhì)：生產(chǎn)廠家訪 問 量：1202詳細(xì)介紹
Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses. Please contact us for details and pricing.
產(chǎn)品咨詢
聯(lián)系人：陳谷一
地址：江蘇省泰州市鳳凰西路168號(hào)
郵箱：taizhou@sunano.com.cn
電話：021-56830191掃一掃以下二維碼了解更多信息
銷售微信咨詢
網(wǎng)站二維碼
歡迎來到